Radical Plasma Source | Muegge, a member of Meyer Burger Technology Group - microwave power for plas
The RPS MA3000 series is designed for the usage at vacuum chambers. Typical process pressures are between 0.3 Torr and 5.0 Torr. A Remote Plasma Source (RPS) is defined by the fact that a plasma is only generated and existing in the RPS itself, not in the...